Hot wall spray chemical vapor deposition equipment
Used for the preparation and growth of high-quality materials such as graphene, carbon nanotubes, transition metal materials, and other thin film materials.
characteristic:
· Multiple independent gas pipelines, sprinkler inlet mode
· Multi temperature zone control, up to 1200 ℃, continuous working temperature up to 1100 ℃
· Horizontal and vertical process structure
· Heating zone size: Length x Diameter 200mm x 100mm (customizable)
· Multi pressure mode (normal pressure, low pressure, etc.) with one click growth
· Automatic sample delivery system, adjustable process distance
· Extreme vacuum 10-3Torr
· Touch screen operation, complete safety interlock function
· Provide multiple gas sources, solid sources, and liquid sources